Description

This oxidation furnace from Bruce technologies Inc (Model 7335B) is a four-stacked diffusion furnace system designed for process wafers up to 150mm. With this furnace the user can grow oxide as thick as 500nm on silicon wafers in a controllable manner through either wet or dry oxidation process. In a single process run it can hold up to 75 wafers.

Additional Resources

Bruce Anneal Furnace
Training Contact: Sivasubramanian Somu
Service Contact: Scott McNamara